MKS AX7695PSK-10 Remote Plasma Source

Brand: MKS
Model:AX7695PSK-10
Product status: New/used
Shipping place: Xiamen, China
Warranty: 365 days
Structural form: Other (specific form may vary depending on application)
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Details

MKS AX7695PSK-10 Remote Plasma Source

Product manual:

MKS AX7695PSK-10 is a high-performance remote plasma source,
Widely used in surface treatment and cleaning processes in semiconductor, display panel, and solar cell manufacturing.
Main features:
Efficient plasma dissociation: capable of providing over 95% gas dissociation rate in the range of 1 to 10 Torr, improving process efficiency.
High flow processing capability: Supports gas flow rates up to 6.0 slm (standard liters per minute), suitable for high flow process requirements.
Integrated design: Built in quartz vacuum chamber and RF power supply, compact structure, easy to install directly on the process chamber.
Multi gas compatibility: capable of handling various gases such as O ₂, N ₂, H ₂, H ₂ O, etc., suitable for chemical vapor deposition (CVD), etching, de gluing and other processes.
Intelligent control: Supports simulation and EtherCAT communication, making it easy to integrate into automation control systems and achieve precise control.
Application areas:
Semiconductor manufacturing: used for high-density plasma treatment of wafer surfaces to improve the uniformity of etching and deposition processes.
Flat panel display production: used for cleaning and surface modification to improve display manufacturing yield.
Solar cell manufacturing: Enhance the surface treatment process of solar cells to improve the photoelectric conversion efficiency.
MKS AX7695PSK-10 has become one of the key plasma source equipment in modern high-end manufacturing industry due to its efficient and reliable performance.