MKS AX7695 Remote Plasma Source

Brand: MKS
Model:AX7695
Product status: New/used
Shipping place: Xiamen, China
Warranty: 365 days
Structural form: Other (specific form may vary depending on application)
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Details

MKS AX7695 Remote Plasma Source

Product manual:

MKS AX7695 is a remote plasma source produced by MKS Instruments, mainly used to provide reactive gases in semiconductor manufacturing processes.
Main features:
High performance: Provides up to 6.0 standard liters per minute (slm) of oxygen or oxygen nitrogen mixed gas flow rate,
Meet the demand for reactive gases in semiconductor processing.
Multiple gas supply: supports 100% oxygen
The ignition gas supply of argon or 90% oxygen/10% nitrogen is suitable for different process requirements.
Integrated design:
Integrating the quartz vacuum chamber, radio frequency (RF) power supply, and all necessary control functions into a compact self-contained unit,
Easy to install directly on the process chamber of the tool.
High reliability: designed to meet the high requirements of semiconductor manufacturing environments, with excellent durability and stability.
Application areas:
This remote plasma source is widely used in the semiconductor manufacturing industry, especially in the following processes:
Thin film deposition: used to deposit thin films on the surface of silicon wafers.
Etching: Used to etch patterns on silicon wafers.
Cleaning: Used to clean the surface of silicon wafers and remove organic pollutants.
Maintenance and replacement:
Long term use may lead to a decrease in module performance. Regular inspection and replacement of the module can ensure the stability and efficient operation of the process.