LEYBOLD TURBOVAC 50 Turbomolecular Pump

Product manual:

Main features:
High vacuum performance: TURBOVAC 50 can achieve extremely high vacuum levels, suitable for applications that require ultra-high vacuum environments.
Technical parameters:
Pumping speed: TURBOVAC 50 typically has a relatively low pumping speed, but is sufficient to meet the needs of small vacuum systems.
Interface type: Usually provides multiple interface options, such as ISO-K or CF flange, to adapt to different system requirements.
Application areas:
Semiconductor manufacturing: used for vacuum deposition, etching, and other semiconductor manufacturing processes.
Research experiment: As part of ultra-high vacuum equipment in high-energy physics, materials science, and other research fields.
Mass spectrometry analysis: As an important component of the vacuum system in a mass spectrometer, it ensures high accuracy and reliability of sample analysis.
Surface Science: Used for surface analysis techniques such as X-ray photoelectron spectroscopy (XPS) or scanning electron microscopy (SEM).
Coating process: Provide the required high vacuum environment during optical coating and other precision coating processes.

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