LAM 853-800838-010 RF Generator

Product manual:

LAM 853-800838-010 RF generator is mainly used in the field of semiconductor manufacturing,
Especially in processes such as plasma etching and thin film deposition. The following are its main application areas:
Plasma etching:
The RF generator provides necessary RF energy during the etching process to control the generation and stability of plasma.
Thin film deposition:
In the process of chemical vapor deposition (CVD) or physical vapor deposition (PVD),
The importance of microelectronics is self-evident, ensuring more efficient and precise manufacturing processes, and improving the quality and performance of final products.
Main features:
Function: This module is used to generate and adjust RF signals to drive processes such as plasma etching and deposition.
Connection method: Equipped with coaxial connectors and 9-pin serial connectors for easy connection and communication with other devices.
Compatibility: Compatible with LAM Research's 2300 series KIYO FXT and other devices.
Application areas:
This RF module is widely used in the field of semiconductor manufacturing, especially in the following areas:
Etching process: used for precise control of plasma etching process.
Thin film deposition: providing necessary radio frequency energy during chemical vapor deposition (CVD) process.
Surface treatment: used for surface modification and cleaning processes.

Product details picture:

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