Details
LAM 810-073479-003 Gas Box Module
Product manual:
The LAM 810-073479-003 gas box module is a key component designed specifically for semiconductor manufacturing equipment,
Usually used to control and manage the distribution and flow of gases.
This module is widely used in applications such as chemical vapor deposition (CVD)
In processes such as physical vapor deposition (PVD) and etching, it provides guarantees for precise gas supply and efficient process control.
Main features:
High precision gas control:
Support precise flow regulation of multiple industrial gases to ensure consistency of process conditions.
Modular design:
Compact structure, easy to integrate into existing equipment, easy to install and maintain.
High durability:
The preferred materials are corrosion-resistant metals and high-performance sealing materials, which can withstand complex process gases and harsh working environments.
Intelligent management:
Integrate advanced sensing and control technologies to achieve real-time monitoring and feedback of gas flow rate, pressure, and temperature.
Security guarantee:
Equipped with multiple safety protection mechanisms to prevent equipment damage or process failure caused by gas leaks or abnormal flow rates.
Application areas:
Semiconductor manufacturing:
Applied to CVD, PVD, etching, and other process steps that require precise gas supply.
Industrial gas management:
Used in high-end manufacturing equipment to control the distribution and mixing of multiple gases.
Laboratory and R&D equipment:
Provide precise and stable gas control support for complex experiments.
Technical advantages:
Accuracy: Advanced gas control technology ensures high repeatability and stability of the process.
Strong adaptability: supports multiple gas types and flow ranges, suitable for different process requirements.
Long term reliability: High quality materials and optimized design ensure long-term stable operation of the module.
Product details picture:
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