LAM 660-072826-200 RF Generator

Brand: LAM
Model:660-072826-200
Product status: New/used
Shipping place: Xiamen, China
Warranty: 365 days
Structural form: Other (specific form may vary depending on application)
Please contact Yvonne for quotation, thank you!

Details

LAM 660-072826-200 RF Generator

Product manual:

The LAM 660-072826-200 RF generator is mainly used in semiconductor manufacturing and high-precision processes,
Provide stable RF energy to support plasma generation and control. Its main application areas include:
1. Semiconductor manufacturing:
Chemical Vapor Deposition (CVD): Provides energy to reaction gases, generates thin films, and is applied in integrated circuit manufacturing.
Plasma etching: Generating plasma to remove materials or form fine patterns.
2. Plasma treatment:
Plasma cleaning: Removing pollutants to ensure high-quality material surfaces.
Surface modification: enhances the adhesion, wettability, and other properties of materials.
3. Manufacturing of microelectronic devices:
Thin film deposition: precise control of thin film thickness and uniformity, applied in electronic device manufacturing.
4. Photovoltaic industry:
Solar cell manufacturing: used for thin film deposition and etching to ensure efficient energy conversion.
LAM 660-072826-200 supports multiple high-precision industrial and scientific fields by providing efficient and stable RF output.